Atomspheric pressure organometallic vapor-phase epitaxial growth and characterization of Ga0.4In0.6P/(Al0.4Ga0.6)0.5In0.5P strained quantum wells

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Abstract
Single and multiple Ga0.4In0.6P/(Al0.4Ga0.6)0.5In0.5P quantum wells have been grown using atmospheric pressure organometallic vapor phase epitaxy. The Ga0.4In0.6P well layers are coherently strained to match the lattice parameter of the GaAs substrate. Transmission electron microscopic results showed that the quantum‐well layers are very uniform in thickness and the interface is abrupt and free of misfit dislocations. The photoluminescence peak energy increases as the well width decreases, due to carrier confinement in the quantum well. Growth interruptions do not change the photoluminescence peak energy of the quantum well. However, the photoluminescence intensity is drastically reduced for longer growth interruption times. Higher‐order x‐ray diffraction satellite peaks and a narrow photoluminescence halfwidth are observed in a 20‐layer multiple‐quantum‐well sample, indicative of high structural uniformity and precise control of the composition and thickness during the growth process. Considering the effect of strain on the heterojunction band offsets, the photoluminescence peak energy of the strained quantum well can be described by a simple theory as a function of the well width.