Basic characteristics of chromium nitride films by dynamic ion beam mixing
- 1 January 1993
- journal article
- Published by Elsevier in Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms
- Vol. 80-81, 1376-1379
- https://doi.org/10.1016/0168-583x(93)90802-d
Abstract
No abstract availableKeywords
This publication has 3 references indexed in Scilit:
- Fundamental study of TiN films deposited by ion beam mixingMaterials Science and Engineering: A, 1989
- Properties of Cr–N films produced by reactive sputteringJournal of Vacuum Science & Technology A, 1986
- Chromium nitride films synthesized by radio-frequency reactive ion platingJournal of Vacuum Science & Technology A, 1986