Surfaces and Interfaces of High-T_c Superconductors for Contact and Junction Formation Studied with Synchrotron Radiation Photoemission Spectroscopy

1 November 1988

journal article
Published by IOP Publishing in Japanese Journal of Applied Physics

Vol. 27 (11A) , L2233
https://doi.org/10.1143/jjap.27.l2233

Abstract

Interface characteristics between contact metals or junction materials and oxide superconductors were analyzed by synchrotron radiation photoemission spectroscopy. A new surface processing technique consisting of O⁺ ion sputtering and in-situ Au deposition processes on YBa₂Cu₃O_y was developed to realize very low contact resistance based on these SRPES experiments. Furthermore, a strong interface reaction in the Si/YBa₂Cu₃O_y system for junction formation was observed, suggesting that amorphous Si is not a good candidate for the junction material.

Keywords

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Japanese Journal of Applied Physics, 1988
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Surfaces and Interfaces of High-Tc Superconductors for Contact and Junction Formation Studied with Synchrotron Radiation Photoemission Spectroscopy

Abstract

Keywords

Surfaces and Interfaces of High-T_c Superconductors for Contact and Junction Formation Studied with Synchrotron Radiation Photoemission Spectroscopy