Mass Spectrometric Studies of SiO2 Deposition in an Indirect Plasma Enhanced LPCVD System

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Abstract
Reaction pathways for the low temperature deposition of from silane and indirect plasma‐excited oxygen‐nitrogen mixtures are proposed based on experimental evidence gained from mass spectrometry in an indirect plasma enhanced chemical vapor deposition chamber. It was observed that ∼80–85% of the silane was oxidized to byproduct hydrogen and only about 15–20% to water. Such conversion levels have led us to interpret that silanol could be the precursor for film deposition, rather than siloxane which has generally been cited in the literature. From mass spectrometry, we have also shown the effects of the plasma, and of mixing small amounts of with the oxygen flow, in increasing the deposition rate of . Free radical reaction of nitric oxide, synthesized from the reaction of oxygen and nitrogen in the plasma chamber, and an increase in atomic oxygen concentration, are believed to be the reasons for these deposition rate increases. Through mass spectrometry we have, in addition, been able to identify products, presumably originating from terminating reactions, among a sequence of chemical reactions proposed for the deposition of .

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