Analysis of carrier mobility and concentration in Si-doped GaN grown by reactive molecular beam epitaxy
- 1 May 1998
- journal article
- Published by Elsevier in Solid-State Electronics
- Vol. 42 (5) , 839-847
- https://doi.org/10.1016/s0038-1101(98)00087-2
Abstract
No abstract availableKeywords
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