Comment on “Quantum Interferometric Optical Lithography: Exploiting Entanglement to Beat the Diffraction Limit”
- 12 February 2001
- journal article
- research article
- Published by American Physical Society (APS) in Physical Review Letters
- Vol. 86 (7) , 1389
- https://doi.org/10.1103/physrevlett.86.1389
Abstract
A Comment on the Letter by Agedi N. Boto, et al., Phys. Rev. Lett. 85, 2733 (2000).Keywords
This publication has 1 reference indexed in Scilit:
- Quantum Interferometric Optical Lithography: Exploiting Entanglement to Beat the Diffraction LimitPhysical Review Letters, 2000