Quantitative Spectroscopy of Interstitial Oxygen in Silicon

Abstract
Quantitative data are presented on the infrared (IR) absorption of interstitial oxygen in oxygen‐rich silicon using Fourier transform spectroscopy. Besides the well‐known 515 and 1106 cm−1 room temperature IR bands, due to the symmetric and antisymmetric vibrations of the entity, respectively, three other bands at 1227, 1720, and 1013 cm−1 are reported, whose intensities are scaled with those of the 515 and 1106 cm−1 bands. The band at 1227 cm−1 has often been confused with an oxygen precipitate band observed at 1225 cm−1 in annealed silicon. Evidence is given that the 1227 cm−1 band is related to interstitial oxygen. It is also shown that another band at 1720 cm−1 is a combination of the antisymmetric mode of with a phonon combination of the silicon lattice. A weak band at 1013 cm−1 is reported for the first time, and it is attributed to an overtone of the 515 cm−1 mode.