Low-Temperature Thermal Expansion ofSi
- 5 April 1971
- journal article
- research article
- Published by American Physical Society (APS) in Physical Review Letters
- Vol. 26 (14) , 829-832
- https://doi.org/10.1103/physrevlett.26.829
Abstract
Measurements are described of the thermal expansion of two samples of Si. One shows a large anomaly in resulting from the structural transformation, which starts above 30°K and continues below the superconducting transition temperature . The other sample shows only about 1% structural transformation, and the associated anisotropy in the discontinuity of at shows that quadratic terms in the strain dependence of are unusually large.
Keywords
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