Chemical vapour deposition of high-Tcsuperconducting thin films

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Abstract
Fabrication of high-temperature superconducting thin films (Y-Ba-Cu-O, Bi-Sr-Ca-Cu-O, Tl-Ba-Ca-Cu-O systems) by chemical vapour deposition (CVD) is reviewed. The key to the use of the CVD method is to find volatile compounds for the metallic constituents of superconductors, beta -diketonate complexes such as acetylacetonates and dipivaloylmethanates have been successfully used as source materials. The quality of the films grown is affected by the deposition temperature, substrate material and post-deposition annealing procedure. Considerable progress has recently been made and the critical properties of CVD-grown films are now equal to those of physical vapour-deposited films.