Stress and Density Effects on Infrared Absorption Spectra of Silicate Glass Films

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Abstract
Using silicate glass, the shifts in the main peak located between 1000–1100 cm−1 were studied to see the effects of stress and density changes of silicon oxides on the infrared (IR) absorption spectra. The IR spectra, stresses, and densities of the oxide films were measured after heat‐treatments at various temperatures in a dry nitrogen atmosphere. A linear relationship exists between and intrinsic stress inside the film, originating from bond strain. The slope is . On the other hand, lineality between and density is seen only among films having the same chemical compositions of silicon dioxides and those with silanol groups.

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