Laser focused atomic deposition: A new lithography tool
- 19 February 1996
- journal article
- Published by AIP Publishing in Applied Physics Letters
- Vol. 68 (8) , 1034-1036
- https://doi.org/10.1063/1.116239
Abstract
We have used the force exerted on a neutral atom by an optical standing wave to focus a neutral atomic beam into a grating structure that is deposited on a substrate. We have made gratings with pitch of 294 nm, linewidths of δ=40–45 nm and contrast ≳10:1, over an area of 7.6 mm2. We discuss the conditions needed to make the narrowest structures, and how these conditions affect the performance of this technique as a lithography tool. We also show depositions that have lower resolution, δ≊80 nm, but could cover an area greater than 3×104 mm2.Keywords
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