High-rate growth of microcrystalline silicon films using a high-density SiH4/H2 glow-discharge plasma
- 1 June 2004
- journal article
- Published by Elsevier in Thin Solid Films
- Vol. 457 (1) , 84-89
- https://doi.org/10.1016/j.tsf.2003.12.041
Abstract
No abstract availableKeywords
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