An SiO2-Ta2O5Thin Film Capacitor

• 1 September 1973
• journal article
• Published by Institute of Electrical and Electronics Engineers (IEEE) in IEEE Transactions on Parts, Hybrids, and Packaging
• Vol. 9  (3) , 161-166
• https://doi.org/10.1109/tphp.1973.1136730

Abstract

Keywords

• SILICON DIOXIDE
• ANODIC
• TANTALUM OXIDE
• DIOXIDE FILM
• CAPACITOR
• RF SPUTTERING