Crystalline quality analysis of YBaCuO ultrathin films by high resolution ion backscattering and channeling spectrometry

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Abstract
Medium energy ion scattering combined with channeling was applied to study the crystalline quality of ultrathin YBaCuO films on (100) SrTiO3 and MgO substrates. Films with thicknesses between 3 and 6 nm were deposited by inverted cylindrical magnetron sputtering. Under optimized growth conditions c-axis oriented growth was obtained with minimum yield values of 2%–12% (depending on thickness) for films on SrTiO3 and 23% on MgO. On the surface of the films a disordered region with a thickness of about 0.6 nm independent of substrate, film thickness, and storage time under ambient conditions was observed. During etching experiments an Y-oxide layer was formed on the surface. For films on SrTiO3 at thicknesses above 4 nm an abrupt increase in the minimum yield was found indicating pseudomorphic growth up to this thickness. In contrast, for films on MgO it was found that a critical film thickness of about 3.6 nm is necessary for the formation of a homogeneous film.

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