Edge diffraction enhanced printability in x-ray nanolithography
- 1 November 1998
- journal article
- Published by American Vacuum Society in Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures
- Vol. 16 (6) , 3521-3525
- https://doi.org/10.1116/1.590489
Abstract
No abstract availableKeywords
This publication has 11 references indexed in Scilit:
- Very low contrast X-ray masks for high resolution printingMicroelectronic Engineering, 1998
- Absorber edge effect in proximity X-ray lithographyMicroelectronic Engineering, 1998
- X-ray lithography for ⩽100 nm ground rules in complex patternsJournal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, 1997
- Extendibility of synchrotron radiation lithography to the sub-100 nm regionJournal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, 1996
- X-ray nanolithography: Extension to the limits of the lithographic processMicroelectronic Engineering, 1996
- Updated system model for x-ray lithographyJournal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, 1994
- Replication of very small periodic gratings with proximity x-ray lithographyMicroelectronic Engineering, 1994
- Simultaneous optimization of spectrum, spatial coherence, gap, feature bias, and absorber thickness in synchrotron-based x-ray lithographyJournal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, 1993
- Electromagnetic calculation of soft x-ray diffraction from 0.1-μm scale gold structuresJournal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, 1991
- Absence of resolution degradation in X-ray lithography for λ from 4.5nm to 0.83nmMicroelectronic Engineering, 1990