Study of emission and sputtering yields in some alloys and oxide by glow discharge optical spectrometry: Quantification of analysis
- 1 August 1985
- journal article
- research article
- Published by Wiley in Surface and Interface Analysis
- Vol. 7 (4) , 169-176
- https://doi.org/10.1002/sia.740070404
Abstract
No abstract availableKeywords
This publication has 9 references indexed in Scilit:
- Comparative study of ion implantation profiles in metalsSurface and Interface Analysis, 1984
- Temperatures, electron densities and degrees of ionization in a boosted glow discharge emission lampSpectrochimica Acta Part B: Atomic Spectroscopy, 1982
- Surface analysis by glow dischargeSurface and Interface Analysis, 1981
- Optical spectroscopy for diagnostics and process control during glow discharge etching and sputter depositionJournal of Vacuum Science and Technology, 1978
- L'analyse des surfaces métalliques par spectrométrie d'émission à décharge luminescenteSpectrochimica Acta Part B: Atomic Spectroscopy, 1978
- Self-absorption and Doppler temperatures of emission lines excited in a glow discharge lampSpectrochimica Acta Part B: Atomic Spectroscopy, 1976
- Sputtering in a glow discharge for spectrochemical analysisAnalytical Chemistry, 1972
- Eine neue glimmentladungslampe für die optische emissionsspektralanalyseSpectrochimica Acta Part B: Atomic Spectroscopy, 1968
- Sputtering Yields of Metals for Ar+ and Ne+ Ions with Energies from 50 to 600 evJournal of Applied Physics, 1961