Gas contamination in a field-ion microscope pumped by sputter-ion pumps
- 1 September 1967
- journal article
- Published by IOP Publishing in Journal of Scientific Instruments
- Vol. 44 (9) , 802-803
- https://doi.org/10.1088/0950-7671/44/9/443
Abstract
No abstract availableKeywords
This publication has 2 references indexed in Scilit:
- Increase of Residual Background Gases During Ultrahigh-Vacuum Mass Spectroscopic AnalysisJournal of Vacuum Science and Technology, 1966
- Gas evolution during baking of sputter-ion pumpsVacuum, 1964