Silicon micro/nanomechanical device fabrication based on focused ion beam surface modification and KOH etching
- 28 February 1997
- journal article
- Published by Elsevier in Microelectronic Engineering
- Vol. 35 (1-4) , 401-404
- https://doi.org/10.1016/s0167-9317(96)00210-9
Abstract
No abstract availableKeywords
This publication has 4 references indexed in Scilit:
- Localized fabrication of Si nanostructures by focused ion beam implantationApplied Physics Letters, 1992
- High resolution patterning of silicon by selective gallium dopingJournal of Vacuum Science & Technology B, 1983
- Anisotropic etching of siliconIEEE Transactions on Electron Devices, 1978
- Ethylene Diamine-Pyrocatechol-Water Mixture Shows Etching Anomaly in Boron-Doped SiliconJournal of the Electrochemical Society, 1971