Plasma processing of oxide systems in the temperature range 1000-3000 K

1 January 1980

journal article
Published by Walter de Gruyter GmbH

Vol. 52 (7) , 1817-1827
https://doi.org/10.1351/pac198052071817

Abstract

Article Plasma processing of oxide systems in the temperature range 1000-3000 K was published on January 1, 1980 in the journal Pure and Applied Chemistry (volume 52, issue 7).

Keywords

JANUARY
PUBLISHED
OXIDE SYSTEMS
PROCESSING OF OXIDE
PLASMA PROCESSING
JOURNAL PURE
ARTICLE PLASMA
K ARTICLE