Implantation of dopants into indium phosphide
- 1 March 1985
- journal article
- Published by AIP Publishing in Journal of Applied Physics
- Vol. 57 (5) , 1656-1660
- https://doi.org/10.1063/1.334432
Abstract
Seven donors (Si, S, Ge, Se, Sn, Te, and Pb) and nine acceptors (Be, Mg, Cr, Mn, Fe, Cu, Zn, Cd, and Hg) have been implanted into liquid-encapsulated Czochralski InP(Fe). For each dopant, the first four moments of the density profile have been extracted by fitting Pearson IV distributions to secondary ion mass spectrometry data. The results suggest that, when implanting into indium phosphide at reduced energies not too far from 1, the mean will be 1/5 larger than the theoretical prediction and the standard deviation will be twice the theoretical prediction.This publication has 3 references indexed in Scilit:
- Theoretical and empirical distributions for ion implantation profiles in InPRadiation Effects, 1982
- The pearson IV distribution and its application to ion implanted depth profilesRadiation Effects, 1980
- Critical angles for channeling of low energy ions in tungstenCanadian Journal of Physics, 1968