A NEW ELLIPSOMETRIC PROGRAMME APPLIED TO THE CHARACTERIZATION OF TRANSPARENT CONDUCTING TITANIUM NITRIDE FILMS

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Abstract
The optical characterization of TiN films produced on Si substrates by ion-implantation was performed by handling the ellipsometric measurements through a flexible program which well conforms to the various experimental situations. The results obtained on as-implanted and transient thermally annealed films are discussed in relation to different possible technological applications

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