Ion-Beam Deposition of Thin Films:Influence on Surface and Volume Microstructure
- 1 January 1985
- journal article
- Published by Springer Nature in MRS Proceedings
Abstract
The effects of ion bombardment during film deposition on surface and volume microstructure were studied. Both metal and dielectric films were investigated. Scattered light and optical constants were examined for evaporated, sputtered and ion assisted films.Keywords
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