Comparison of Oxidation Rates for a ‐ Si1 − x C x : H Films Deposited from Pulsed and Continuous Wave RF Plasmas
- 1 September 1998
- journal article
- Published by The Electrochemical Society in Journal of the Electrochemical Society
- Vol. 145 (9) , 3271-3277
- https://doi.org/10.1149/1.1838797
Abstract
No abstract availableThis publication has 0 references indexed in Scilit: