The plasma-assisted chemical vapour deposition of TiC, TiN and TiCxN1−x

• 1 June 1981
• journal article
• Published by Elsevier in Thin Solid Films
• Vol. 80  (1-3) , 221-225
• https://doi.org/10.1016/0040-6090(81)90225-x

Abstract

Keywords

• PLASMA ASSISTED
• CVD
• CHEMICAL VAPOUR DEPOSITION
• ASSISTED CHEMICAL
• COATINGS OBTAINED
• SUBSTRATE TEMPERATURE
• TIC