Design and characterization of a compact two-target ultrahigh vacuum magnetron sputter deposition system: Application to the growth of epitaxial Ti1−xAlxN alloys and TiN/Ti1−xAlxN superlattices
- 1 January 1993
- journal article
- Published by American Vacuum Society in Journal of Vacuum Science & Technology A
- Vol. 11 (1) , 136-142
- https://doi.org/10.1116/1.578279
Abstract
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