4-Methyl-1,2,3-selenadiazole: a liquid selenium source for the low-temperature chemical vapour deposition of selenium-containing materials
- 1 January 1993
- journal article
- research article
- Published by Royal Society of Chemistry (RSC) in Journal of Materials Chemistry
- Vol. 3 (4) , 429-430
- https://doi.org/10.1039/jm9930300429
Abstract
The use of 4-methyl-1,2,3-selenadiazole as a precursor for the chemical vapour deposition of selenium-containing materials has been investigated. The results indicate that this is a useful precursor for the low-temperature plasma-assisted chemical vapour deposition of selenium, with a growth rate of 500 Å min–1 being achieved with a substrate temperature of 40 °C and a plasma power density of 1 W cm–2.Keywords
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