Interactions of methanol with stoichiometric and defective TiO2(110) and (100) surfaces

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Abstract
Interactions of CH 3 OH with stoichiometric (nearly defect-free) and defective TiO 2 (110) and (100) surfaces have been studied using x-ray photoelectron spectroscopy and ultraviolet photoemissionspectroscopy. The CH 3 OH saturation coverage was increased by increasing the number of defects created by electron-beam exposure or Ar + ion bombardment. A small percentage of any defects produced were healed upon the saturation exposure (defect healing means a reduction in defect signal observed by the photoemission measurements). The structural influence on the adsorption and surface defect reactivity was found to be less significant for CH 3 OH than for H 2 O . The CH 3 OH coverages at a given exposure and defect reactivity were comparable for both the (100) and (110) surfaces.