Abstract
This work consists of two sequential parts, which review the advances in uncovering the capacity of VLEED, STM and PES in revealing the nature and kinetics of oxidation bonding and its consequences for the behavior of atoms and valence electrons at a surface; and in quantifying the O–Cu(001) bonding kinetics. The first part describes the model in terms of bond making and its effect on the valence DOS and on the surface potential barrier (SPB) for surfaces with chemisorbed oxygen. One can replace the hydrogen in a H2O molecule with an arbitrary less electronegative element and extend the M2O to a solid surface with Goldschmidt contraction of the bond length, which formulates a specific oxidation surface with identification of atomic valences and their correpondence to the STM and PES signatures. As consequences of bond making, oxygen derives foou additional DOS features in the valence band and above, i.e. O–M bonding (~ -5 eV), oxygen nonbounding lone pairs (~ - 2 eV), holes (≤EF), and antibonding metal di...

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