Chemical Vapor Deposition of Epitaxial Silicon from Silane at Low Temperatures: II . Plasma Enhanced Deposition
- 1 August 1989
- journal article
- Published by The Electrochemical Society in Journal of the Electrochemical Society
- Vol. 136 (8) , 2398-2405
- https://doi.org/10.1149/1.2097381
Abstract
No abstract availableThis publication has 0 references indexed in Scilit: