Effects of vacuum environment on the sub-structure of evaporated F.C.C. metal films

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Abstract
The effect of the vapour pressure environment upon the sub-structure of evaporated thin films of silver, gold, nickel and aluminium has been studied by electron transmission and selected area diffraction microscopy. Special attention has been paid to the grain size and crystal perfection of the metal films as a function of substrate temperature, film thickness, rate of deposition and nominal vapour pressure in the range 10−2 to 10−9 torr. In the case of aluminium, the combined influence of substrate temperature and pressure has yielded pertinent information concerning the influence of impurities on the nucleation and growth of thin films.