Characterization of a Rapid Thermal Annealed TiNxOy/TiSi2 Barrier Layer
- 1 January 1990
- journal article
- Published by Springer Nature in MRS Proceedings
Abstract
No abstract availableKeywords
This publication has 4 references indexed in Scilit:
- Investigation of reactively sputtered TiN films for diffusion barriersThin Solid Films, 1986
- Properties and microelectronic applications of thin films of refractory metal nitridesJournal of Vacuum Science & Technology A, 1985
- Metastable phase formation in titanium-silicon thin filmsJournal of Applied Physics, 1985
- Formation of Titanium Nitride/Silicide Bilayers by Rapid Thermal Anneal in NitrogenMRS Proceedings, 1985