The Electrodeposition of Thin Magnetic Permalloy Films
- 1 March 1967
- journal article
- Published by AIP Publishing in Journal of Applied Physics
- Vol. 38 (3) , 1423-1430
- https://doi.org/10.1063/1.1709651
Abstract
The work of Wolf has shown that electrodeposited magnetic films, above a thickness range of a few hundred Angstroms, could be obtained on flat metallized glass substrates, with properties adequate for computer memories. New problems arise when one tries to prepare very thin films (Hc, HkΔ) are examined. The deposition on metallic substrates has an obvious interest when using ground planes or wires. In this case the crystalline structure of the substrate has as much importance as its chemical activity, and we will show the usefulness of an intermediate layer of controlled grain size and isotropy. The results of these studies are related to the aging behaviour of plated films.This publication has 4 references indexed in Scilit:
- Electrodeposited Ni-Fe-As Magnetic Thin FilmsJournal of the Electrochemical Society, 1966
- The Electrodeposition of Nickel-Iron-Phosphorus Thin Films for Computer Memory UseJournal of the Electrochemical Society, 1964
- Electrodeposition of Magnetic MaterialsJournal of Applied Physics, 1962
- Variation of Composition with Thickness in Thin Electrodeposited Films of Nickel-Iron AlloysJournal of the Electrochemical Society, 1961