Hexafluoroacetone in deep UV resist chemistry: new resins, dissolution inhibitors and crosslinkers.
- 1 January 1992
- journal article
- Published by Technical Association of Photopolymers, Japan in Journal of Photopolymer Science and Technology
- Vol. 5 (1) , 85-92
- https://doi.org/10.2494/photopolymer.5.85
Abstract
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