Ultraviolet photoemission studies of the oxidation of thin Bi films using synchrotron radiation
- 15 November 1976
- journal article
- research article
- Published by American Physical Society (APS) in Physical Review B
- Vol. 14 (10) , 4295-4303
- https://doi.org/10.1103/physrevb.14.4295
Abstract
Three aspects of photoelectron spectroscopy are used to examine the oxidation process in thin Bi films with cleaved layered crystals of - compounds used as substrates. Valence-band emission, core emissions, and the conduction-band density of states are all examined separately. The changes in the electronic structure shows that oxidation occurs in three stages as oxygen exposure increases: (i) a precursor stage of weak chemisorption; (ii) a sudden onset of strong rapid oxidation and growth of a two-dimensional oxides; and (iii) a slower growth of the oxide layer. Bi core-level shifts, the opening of a band gap at the Fermi level, and spin-orbit splitting in the conduction band in the oxide are all discussed.
Keywords
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