Attainment of 0.13-μm lines and spaces by excimer-laser projection lithography in ‘‘diamond-like’’ carbon-resist

Publisher Website
Google Scholar
Abstract
Recent results are reported for the use of ‘‘diamond‐like’’ hard carbon as a photoresist for excimer‐laser projection lithography. Well resolved 0.13 μm lines and spaces have been achieved using 193 nm radiation and reflective optics.