Monte Carlo calculation for structural modifications in ion-assisted thin film deposition due to thermal spikes

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Abstract
The microstructure of an ion-assisted two-dimensional film, grown from the vapor phase, is modeled by a computer simulation. The inert gas ions, impinging during the vapor deposition, are assumed to create thermal spikes slightly below the film surface. The modification of the microstructure due to atomic hopping, which is induced by the quickly expanding temperature pulse of the spike, is studied. It is demonstrated that as the ratio of the current densities of ions to vapor is increased, the porous columnar microstructure of the film becomes destroyed. Instead of long cavities between the parallel columns, large elongated closed voids are formed.

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