Growth of diamond in a pulsed microwave discharge
- 28 February 1994
- journal article
- Published by Elsevier in Diamond and Related Materials
- Vol. 3 (3) , 231-238
- https://doi.org/10.1016/0925-9635(94)90085-x
Abstract
No abstract availableThis publication has 18 references indexed in Scilit:
- Developments in the deposition of hard coatings by plasma-based techniquesVacuum, 1990
- The effect of oxygen in diamond deposition by microwave plasma enhanced chemical vapor depositionJournal of Materials Research, 1990
- Diamond thin film technology I. Diamond depositionAdvanced Materials, 1990
- Diamond deposition at low substrate temperaturesJournal of Crystal Growth, 1990
- Preparation of TiB2 and TiBxNy coatings by PACVDSurface and Coatings Technology, 1989
- Diamond—Ceramic Coating of the FutureJournal of the American Ceramic Society, 1989
- Low temperature pulsed plasma deposition. Part I—a new technique for thin film deposition with complete gas dissociationVacuum, 1988
- Synthesis of diamonds by use of microwave plasma chemical-vapor deposition: Morphology and growth of diamond filmsPhysical Review B, 1988
- Growth of diamond particles from methane-hydrogen gasJournal of Materials Science, 1982
- Vapor Deposition of Diamond Particles from MethaneJapanese Journal of Applied Physics, 1982