Effects of rf-Bias on Properties of Sputtered Silicon Films
- 1 July 1981
- journal article
- Published by IOP Publishing in Japanese Journal of Applied Physics
- Vol. 20 (7) , L485
- https://doi.org/10.1143/jjap.20.l485
Abstract
No abstract availableKeywords
This publication has 4 references indexed in Scilit:
- Zero-field muon spin relaxation reflecting dynamics of spin glassSolid State Communications, 1980
- Importance of argon pressure in the preparation of rf-sputtered amorphous silicon–hydrogen alloysJournal of Vacuum Science and Technology, 1979
- Influence of deposition conditions on sputter-deposited amorphous siliconJournal of Applied Physics, 1978
- Substitutional doping of amorphous siliconSolid State Communications, 1975