Optical Linewidth Measurements on Photomasks and Wafers† †Contribution of the National Bureau of Standards; not subject to copyright.
- 1 January 1982
- book chapter
- Published by Elsevier
Abstract
No abstract availableThis publication has 24 references indexed in Scilit:
- Accurate linewidth measurements on integrated-circuit photomasksPublished by National Institute of Standards and Technology (NIST) ,1980
- Automatic Width And Overlay MeasurementPublished by SPIE-Intl Soc Optical Eng ,1978
- Optical Linewidth Measurements On WafersPublished by SPIE-Intl Soc Optical Eng ,1978
- Optical Linewidth Measurements On Silicon And Iron-Oxide PhotomasksPublished by SPIE-Intl Soc Optical Eng ,1977
- Comparison Of Linewidth Measurements On An Sem/Interferometer System And An Optical Linewidth-Measuring MicroscopePublished by SPIE-Intl Soc Optical Eng ,1977
- Linewidth measurement with an optical microscope: the effect of operating conditions on the image profileApplied Optics, 1977
- Photolithography in Integrated Circuit Mask MetrologyIBM Journal of Research and Development, 1974
- Some Theoretical and Experimental Studies of a Scanning Photoelectric MicroscopeMetrologia, 1971
- Precise Measurement by Image-SplittingJournal of the Optical Society of America, 1960
- Electromagnetic diffraction in optical systems, II. Structure of the image field in an aplanatic systemProceedings of the Royal Society of London. Series A. Mathematical and Physical Sciences, 1959