On double layer PMMA resist systems: Development rates and molecular weight distributions of commercial PMMA resists
- 30 April 1990
- journal article
- Published by Elsevier in Microelectronic Engineering
- Vol. 11 (1-4) , 561-564
- https://doi.org/10.1016/0167-9317(90)90171-o
Abstract
No abstract availableKeywords
This publication has 2 references indexed in Scilit:
- Lithography for ultrashort channel silicon field effect transistor circuitsJournal of Vacuum Science & Technology B, 1988
- Fabrication of 30-nm-scale structures for electron transport studies using a polymethylmethacrylate bilayer resistJournal of Vacuum Science & Technology B, 1987