Improvement of Post-Exposure Delay Stability in Alicyclic ArF Excimer Photoresists

• 1 January 1999
• journal article
• Published by Technical Association of Photopolymers, Japan in Journal of Photopolymer Science and Technology
• Vol. 12  (4) , 553-560
• https://doi.org/10.2494/photopolymer.12.553

Abstract

Keywords

• ARF EXCIMER
• POST EXPOSURE
• ALICYCLIC ARF
• EXCIMER PHOTORESISTS
• EXPOSURE DELAY