Influence of Ion Bombardment on the Electrical Behaviour of Discontinuous Metal Film Diodes
- 16 March 1986
- journal article
- research article
- Published by Wiley in Physica Status Solidi (a)
- Vol. 94 (1) , K89-K92
- https://doi.org/10.1002/pssa.2210940178
Abstract
No abstract availableThis publication has 8 references indexed in Scilit:
- Influence of organic molecules on the current-voltage characteristic of planar MIM diodesPhysica Status Solidi (a), 1985
- Electron induced off-switching in Au Island film diodesPhysica Status Solidi (a), 1985
- A regeneration model for conducting filaments in MIM diodesPhysica Status Solidi (a), 1985
- Effects of O2 pressure on the voltage-controlled negative resistance and on the electron emission of carbon thin film devices with silver electrodesThin Solid Films, 1984
- Temperature dependence of the on state regeneration in metal/insulator/metal diodesThin Solid Films, 1983
- Current-voltage characteristics of Al-Al2O3-Au devices in a chlorine atmosphereThin Solid Films, 1980
- Conducting filaments and voltage-controlled negative resistance in Al-Al2O3-Au structures with amorphous dielectricThin Solid Films, 1974
- Electrical phenomena in amorphous oxide filmsReports on Progress in Physics, 1970