Suppression of fringe diffraction in localized holographic exposure for DFB laser arrays
- 1 July 1995
- journal article
- Published by Institute of Electrical and Electronics Engineers (IEEE) in IEEE Photonics Technology Letters
- Vol. 7 (7) , 721-723
- https://doi.org/10.1109/68.393185
Abstract
A six-wavelength MQW DFB laser array emitting around 1.55 /spl mu/m realized in a single holographic lithography is described. Fringe-free localized grating isolation is attained using a mask with a novel aperture-edge design. The first-order grating periods as well as the ridge locations can be varied in a large span. The high throughput of holographic lithography is extended to multiwavelength DFB arrays.Keywords
This publication has 3 references indexed in Scilit:
- Fabrication of a four-channel DFB laser transmitter OEIC for 1550 nm operationElectronics Letters, 1993
- Simultaneous operation of ten-channel tunable DFB laser arrays using strained-InGaAsP multiple quantum wellsIEEE Journal of Quantum Electronics, 1993
- Five-wavelength integrated DFB laser arrays with quarter-wave-shifted structuresIEEE Journal of Quantum Electronics, 1987