Spin-dependent hole diffusion in a-Si: H
- 27 September 1984
- journal article
- research article
- Published by Taylor & Francis in Philosophical Magazine Part B
- Vol. 50 (3) , 397-404
- https://doi.org/10.1080/13642818408238864
Abstract
Two-beam photoconductivity (PC), spin-dependent photoconductivity (SDPC), and light-induced ESR (LESR) have been measured on undoped a-Si: H with low spin densities, N s ≤ 1016 cm−3. Below T = 160 K, PC is quenched by irradiation with photon energies less than 1·5 eV. Both LESR and SDPC spectra change correspondingly. In LESR the broad signal due to trapped holes is strongly quenched, whereas the narrow signal due to trapped electrons and dangling bonds decreases only a little. The SDPC spectrum, also containing a broad and a narrow line, changes in the opposite way: the broad line remains almost constant and the narrow signal increases. The results are explained in terms of recombination of trapped electrons with trapped holes via neutral dangling bonds, the rate-determining step being the diffusion of trapped holes towards doubly occupied dangling bonds. Hole diffusion is further identified in spin-dependent dark conductivity measurements on boron-doped a-Si: H.Keywords
This publication has 8 references indexed in Scilit:
- Recombination processes in-Si:H: Spin-dependent photoconductivityPhysical Review B, 1983
- Recombination in-Si: H: Spin-dependent effectsPhysical Review B, 1982
- Spin-dependent photoconductivity in undoped a-Si: HPhilosophical Magazine Part B, 1982
- Infrared quenching of photoconductivity and the study of gap states in hydrogenated amorphous silicon alloysJournal of Applied Physics, 1982
- Correlation effects and the density of states in amorphous siliconSolid State Communications, 1981
- Conductivity Change Due to Electron Spin Resonance in Amorphous Si-Au SystemJournal of the Physics Society Japan, 1981
- Electron Spin Resonance of Doped Glow‐Discharge Amorphous SiliconPhysica Status Solidi (b), 1981
- Luminescence and ESR studies of defects in hydrogenated amorphous siliconSolid State Communications, 1980