Flow behaviour of thin polymer films used for hot embossing lithography
Top Cited Papers
- 31 December 2000
- journal article
- Published by Elsevier in Microelectronic Engineering
- Vol. 54 (3-4) , 229-245
- https://doi.org/10.1016/s0167-9317(00)00414-7
Abstract
No abstract availableKeywords
This publication has 17 references indexed in Scilit:
- Nanoreplication in polymers using hot embossing and injection moldingMicroelectronic Engineering, 2000
- Lithographically induced self-assembly of periodic polymer micropillar arraysJournal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, 1999
- High-efficiency Bragg–Fresnel lenses with 100 nm outermost zone widthReview of Scientific Instruments, 1999
- Suitability of new polymer materials with adjustable glass temperature for nano-imprintingMicroelectronic Engineering, 1999
- Line width control using a defocused low voltage electron beamMicroelectronic Engineering, 1999
- Nanostructuring of polymers and fabrication of interdigitated electrodes by hot embossing lithographyMicroelectronic Engineering, 1999
- Nanoimprint lithography for a large area pattern replicationMicroelectronic Engineering, 1999
- The deposition of anti-adhesive ultra-thin teflon-like films and their interaction with polymers during hot embossingApplied Surface Science, 1999
- Imprint lithography with sub-10 nm feature size and high throughputMicroelectronic Engineering, 1997
- Nanoimprint lithographyJournal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, 1996