Nanoimprint lithography for a large area pattern replication
- 1 May 1999
- journal article
- Published by Elsevier in Microelectronic Engineering
- Vol. 46 (1-4) , 319-322
- https://doi.org/10.1016/s0167-9317(99)00094-5
Abstract
No abstract availableKeywords
This publication has 8 references indexed in Scilit:
- Problems of the nanoimprinting technique for nanometer scale pattern definitionJournal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, 1998
- Hot embossing in polymers as a direct way to pattern resistMicroelectronic Engineering, 1998
- Replication techniques for diffractive optical elementsMicroelectronic Engineering, 1997
- Sub-10 nm imprint lithography and applicationsJournal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, 1997
- Imprint Lithography with 25-Nanometer ResolutionScience, 1996
- Imprint of sub-25 nm vias and trenches in polymersApplied Physics Letters, 1995
- Improvements of Nanostructure Patterning in X-Ray Mask MakingJapanese Journal of Applied Physics, 1994
- 50-nm x-ray lithography using synchrotron radiationJournal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, 1994