P-doped polycrystalline silicon films obtained at low temperature by hot-wire chemical vapor deposition
Open Access
- 1 February 1995
- journal article
- Published by Elsevier in Applied Surface Science
- Vol. 86 (1-4) , 600-603
- https://doi.org/10.1016/0169-4332(94)00420-x
Abstract
No abstract availableKeywords
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