Near-field two-photon nanolithography using an apertureless optical probe
- 4 November 2002
- journal article
- Published by AIP Publishing in Applied Physics Letters
- Vol. 81 (19) , 3663-3665
- https://doi.org/10.1063/1.1519329
Abstract
Near-field two-photon optical lithography is demonstrated by using ∼120 fs laser pulses at 790 nm in an apertureless near-field optical microscope, which produces lithographic features with ∼70 nm resolution. The technique takes advantage of the field enhancement at the extremity of a metallic probe to induce nanoscale two-photon absorption and polymerization in a commercial photoresist, SU-8. Even without optimization of the resist or laser pulses, the spatial resolution of this technique is as high as λ/10, nearly a factor of 2 better than techniques based on far field two-photon lithography.Keywords
This publication has 15 references indexed in Scilit:
- Near-field second-harmonic generation at a metal tip apexApplied Physics Letters, 2002
- Apertureless optical near-field fabrication using an atomic force microscope on photoresistsApplied Physics Letters, 2002
- Characterization of a two-dimensional cantilever array with through-wafer electrical interconnectsApplied Physics Letters, 2002
- Finer features for functional microdevicesNature, 2001
- Apertureless scanning near-field second-harmonic microscopyOptics Communications, 2000
- Near-Field Fluorescence Microscopy Based on Two-Photon Excitation with Metal TipsPhysical Review Letters, 1999
- Feasibility of molecular-resolution fluorescence near-field microscopy using multi-photon absorption and field enhancement near a sharp tipJournal of Applied Physics, 1999
- Design of Organic Molecules with Large Two-Photon Absorption Cross SectionsScience, 1998
- Near field optics: Snapshot of the field emitted by a nanosource using a photosensitive polymerApplied Physics Letters, 1996
- Near-field direct-write ultraviolet lithography and shear force microscopic studies of the lithographic processApplied Physics Letters, 1995