Ion implantation into GaN
Top Cited Papers
- 2 April 2001
- journal article
- review article
- Published by Elsevier
- Vol. 33 (2-3) , 51-108
- https://doi.org/10.1016/s0927-796x(01)00028-6
Abstract
No abstract availableKeywords
This publication has 133 references indexed in Scilit:
- Deformation behavior of ion-beam-modified GaNApplied Physics Letters, 2001
- Models and mechanisms of irradiation-induced amorphization in ceramicsNuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms, 2000
- Behavior of electrically active point defects in irradiated MOCVD n-GaNPhysica B: Condensed Matter, 1999
- Metastable-like behaviour of a sputter deposition-induced electron trap in n-GaNPhysica B: Condensed Matter, 1999
- Defect introduction in epitaxially grown n-GAN during electron beam deposition of Ru schottky contactsPhysica B: Condensed Matter, 1999
- Annealing of ion-implanted GaNPhysica B: Condensed Matter, 1999
- Mechanical properties of the GaN thin films deposited on sapphire substrateJournal of Crystal Growth, 1998
- Ion implantation of Si, Mg and C into Al0.12Ga0.88NSolid-State Electronics, 1997
- Implantation and redistribution of dopants and isolation species in GaN and related compoundsSolid-State Electronics, 1995
- Amorphization, morphological instability and crystallization of Krypton ion irradiated germaniumPhilosophical Magazine A, 1991