Flow regime map and deposition rate uniformity in vertical rotating-disk OMVPE reactors
- 31 October 1992
- journal article
- Published by Elsevier in Journal of Crystal Growth
- Vol. 123 (3-4) , 545-554
- https://doi.org/10.1016/0022-0248(92)90616-q
Abstract
No abstract availableKeywords
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